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Diffusion of phosphorus in silicon stimu...
Publication details
Name:
Diffusion of phosphorus in silicon stimulated by low-energy plasma-ion treatment
Journal:
Sov. Phys. Semicond
Detail info:
13(3), 355 – 356
Year:
1979
Authors:
V. E. Borisenko
,
V. A. Labunov
.
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