| Publication details |
| Name: |
Diffusion of arsenic through porous silicon as a result of heat treatment by exposure to incoherent light for tens of seconds |
| Journal: |
Sov. Phys. Semicond |
| Detail info: |
20(5), 586 – 588 |
| Year: |
1986 |
| Authors: |
V. E. Borisenko, V. A. Labunov.
|
|
