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Publications > Thin film silicide formation by rapid...
Publication details
Name: Thin film silicide formation by rapid thermal processing
Journal: Sov. J. Foreign. Electron. Techn.
Detail info: V. 291, N8, pp.27-53 (review article) - in Russian
Year: 1985
Authors: V. E. Borisenko, L. I. Ivanenko, V. A. Labunov, D. I. Zarovskii, V. V. Tokarev, V. Hitko.
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