Publications > Ten-second annealing of implanted silico... Publication details Name: Ten-second annealing of implanted silicon by low-energy electrons Journal: Sov. Phys. Semicond Detail info: 18(10), 1192 – 1194 Year: 1984 Authors: V. E. Borisenko, D. I. Zarovskii.

© 2003-2011, Center of Nanoelectronics and Novel Materials & Laboratory of Nanophotonics | web@nano-center.org