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Results 121 - 140 of about 160 publications for Author: V. E. Borisenko

N Title Journal or book Year
121 V. E. Borisenko, L. I. Ivanenko, S. Y. Nikitin.
Semiconducting properties of chromium disilicide
Mikroelektronika V.21, N2, pp.69-77 (in Russian) 1992
122 V. E. Borisenko, L. I. Ivanenko, D. I. Zarovskii.
Structure and phase transitions in transiently heated thin film Fe- Si system
Mikroelektronika V.21, N6, pp.27-29 (in Russian) 1992
123 V. E. Borisenko, A. B. Filonov.
Electronic structure calculations for YBa2Cu3O7 by the self-consistent crystalline orbital method
Phys. Stat. Sol. (b) 168(2), 467 – 477 1991
124 V. E. Borisenko, V. V. Tokarev, A. I. Demchenko, A. I. Ivanov.
Influence of boron implantation on phase transformation in nickel silicides
Appl. Surf. Sci 44(3), 241-247 1990
125 V. E. Borisenko, D. I. Zarovskii, V. V. Tokarev, T. M. Pyatkova.
Argon ion implantation influence on phase formation and structure of nickel silicides
Phys. Stat. Sol. (a) 111(2), 499 – 505 1989
126 V. E. Borisenko, V. V. Tokarev, T. M. Pyatkova, A. I. Demchenko.
Growth of epitaxial nickel disilicide during rapid thermal processing of argon-implanted nickel films on silicon
Phys. Stat. Sol. (a) 116(1), 331 – 336 1989
127 V. E. Borisenko, A. B. Filonov, S. Y. Nikitin, A. L. Pushkarchuk.
Electronic property simulation of YBa2Cu3O7 films
Phys. Stat. Sol. (b) 155(1), K127 - K130 1989
128 V. E. Borisenko, L. I. Ivanenko, D. I. Zarovskii, G.V. Litvinovich.
Characterization of chromium silicides formed by rapid thermal processing
Izvestiya vuzov. Physica. N11, p.128-129 (in Russian) 1989
129 V. E. Borisenko, D. I. Zarovskii, V. V. Tokarev.
Influence of argon implantation on the formation of platinum silicides
Phys. Stat. Sol. (a) 107(1), K33 - K35 1988
130 V. E. Borisenko, S. G. Yudin.
Implanted impurity behavior in silicon subjected to transient heating
Phys. Stat. Sol. (a) 109(1), 395 – 402 1988
131 V. E. Borisenko, S. G. Yudin.
Steady-state solubility of substitutional impurities in silicon
Phys. Stat. Sol. (a) 101(1), 123 – 127 1987
132 V. E. Borisenko, V. A. Labunov, A. M. Dorofeev.
High-temperature treatment of porous silicon
Phys. Stat. Sol. (a) 102(1), 193 – 198 1987
133 V. E. Borisenko, A. G. Dutov, K. E. Lobanova, S. G. Yudin.
Redistribution of phosphorus in implanted laser-annealed silicon during subsequent heat treatment lasting up to tens of seconds
Sov. Phys. Semicond 21(8), 891 – 892 1987
134 V. E. Borisenko, S. G. Yudin, R. M. Bayazitov, D. A. Konovalov, I. B. Khaibullin.
Precipitation of a supersaturated substitutional solution of phosphorus in silicon due to heat treatment for periods of seconds
Sov. Phys. Semicond 21(8), 917 – 918 1987
135 V. E. Borisenko, V. Parkhutik.
RBS study of transient thermal and anodic oxidation of tantalum films
Phys. Stat. Sol. (a) 93(1), 123 – 130 1986
136 V. E. Borisenko, V. A. Labunov, A. Nylandsted Larsen, D. I. Zarovskii.
TiSi2 formation during brief heat treatment of titanium films on silicon
Sov. Phys. Tech. Phys 31(5), 599 – 600 1986
137 V. E. Borisenko, V. A. Labunov.
Diffusion of arsenic through porous silicon as a result of heat treatment by exposure to incoherent light for tens of seconds
Sov. Phys. Semicond 20(5), 586 – 588 1986
138 V. E. Borisenko, D. I. Zarovskii.
Formation of chromium silicides by annealing for times < 1 minute
Sov. Phys. Tech. Phys 30(10), 1188 1985
139 V. E. Borisenko, V. V. Gribkovskii, F. F. Komarov, V. S. Solov'yev, P. I. Gaiduk.
Structure modification in As-ion implanted silicon layers during pulse thermal treatment
Rad. Eff. Lett 87(3), 109 – 115 1985
140 V. E. Borisenko, L. I. Ivanenko, V. A. Labunov, D. I. Zarovskii, V. V. Tokarev, V. Hitko.
Thin film silicide formation by rapid thermal processing
Sov. J. Foreign. Electron. Techn. V. 291, N8, pp.27-53 (review article) - in Russian 1985
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